semiconductor fused silica glass ceramic national defense equipment material factory
Quartz Glass Ceramic:
There are two kinds of quartz ceramics. One is produced by using crystalline quartz (quartz sand or crystal) at 1600 degrees, and the other is quartz glass ceramic produced by 1200 degrees after pulverization with quartz glass. Quartz glass ceramic is a new type of high temperature resistant material. It has the advantages of poor thermal conductivity, small expansion coefficient, high temperature resistance, good thermal stability, and low cost. Has been successfully applied to metallurgy, building materials, chemicals, national defense, scientific research and other departments.
Quartz Glass Ceramic properties:Quartz glass has a very low coefficient of thermal expansion, high temperature resistance, excellent chemical stability, excellent electrical insulation, low and stable ultrasonic delay performance, optimum UV transmission performance, and visible light transmission and near infrared spectroscopy. Performance, and has higher mechanical properties than ordinary glass. Therefore, it is one of the indispensable materials in the modern technology of space technology, atomic energy industry, national defense equipment, automation system, and semiconductor, metallurgy, chemical, electric light source, communication, light industry, building materials and other industries.
Data Sheet↓
Item | Unit | Typical Values |
Physical Properties |
Color | Transparent/White |
Raw material | / | Crystal, silica, silicide |
Gas permeability | 0 |
Water Absorption | 0 |
Mechanical Properties |
Rockwell Hardness(45N) | R45N | 40 |
Vickers Hardness (Load 500g) | Gpa(Kg/mm²) | 11.5(1175) |
Flexural Strength(20°C) | Mpa | 108 |
Compressive Strength(20°C) | Mpa | 488 |
Modulus of Elasticity(25°C) | Gpa | 65 |
Thermal Properties |
Thermal Conductivity(25°C) | W(m.K) | 1.71 |
Thermal Expansion Coefficient | 10-7/ºC | 5.5 |
Thermal Shock Resistance | △T°C | 200 |
Maximum Use Temperature | °C | 800 |
Electronic Properties |
Dielectric Constant | Er | 3.5-3.7 |
Volume Resistivity(20°C) | Ω.cm | 1×1019 1×1015 |
Application :
The formation of quartz glass is a result of the high viscosity of the melt. Used in the manufacture of semiconductors, electric light sources, semi-conductive communication devices, lasers, optical instruments, laboratory instruments, electrical equipment, medical equipment and chemical instruments for high temperature and corrosion resistance, chemical, electronics, metallurgy, building materials and national defense industries. Very extensive.
High-purity quartz glass can be used to make optical fibers.
With the development of semiconductor technology, quartz glass is widely used in various processes of semiconductor production. For example, the Czochralski method converts polycrystals into single crystal silicon; the cleaning bath used for cleaning; the diffusion tube used for diffusion, the grooved boat; the bell jar used for ion implantation etc.